作者:
基本信息来源于合作网站,原文需代理用户跳转至来源网站获取       
摘要:
Laser interference lithography is an attractive method for the fabrication of a large-area two-dimensional planar scale grating,which can be employed as a scale for multi-axis optical encoders or a diffractive optical element in many types of optical sensors.Especially,optical configurations such as Lloyd's mirror interferometer based on the division of wavefront method can generate interference fringe fields for the patterning of grating pattern structures at a single exposure in a stable manner.For the fabrication of a two-dimensional scale grating to be used in a planar/surface encoder,an orthogonal two-axis Lloyd's mirror interferometer,which has been realized through innovation to Lloyd’s mirror interferometer,has been developed.In addition,the concept of the patterning of the two-dimensional orthogonal pattern structure at a single exposure has been extended to the non-orthogonal two-axis Lloyd’s mirror interferometer.Furthermore,the optical setup for the non-orthogonal two-axis Lloyd's mirror interferometer has been optimized for the fabrication of a large-area scale grating.In this review article,principles of generating interference fringe fields for the fabrication of a scale grating based on the interference lithography are reviewed,while focusing on the fabrication of a two-dimensional scale grating for planar/surface encoders.Verification of the pitch of the fabricated pattern structures,whose accuracy strongly affects the performance of planar/surface encoders,is also an important task to be addressed.In this paper,major methods for the evaluation of a grating pitch are also reviewed.
推荐文章
HEVC帧内预测Planar和DC模式的VLSI架构设计
高效视频编码
帧内预测
Planar模式
DC模式
超大规模集成电路
QOL Scale-AMILY在喉癌患者照顾者生活质量评价中的应用
QOL Scale-FAMILY
喉癌患者照顾者
生活质量
再调制WDM-PON系统中FBG均衡技术
波分复用无源光网络
反射型半导体光放大器
光纤光栅
均衡
内容分析
关键词云
关键词热度
相关文献总数  
(/次)
(/年)
文献信息
篇名 Laser Interference Lithography for Fabrication of Planar Scale Gratings for Optical Metrology
来源期刊 纳米制造与计量(英文) 学科 工学
关键词 Planar scale grating Interference lithography Lloyd’s mirror interferometer Interference fringe
年,卷(期) 2021,(1) 所属期刊栏目
研究方向 页码范围 3-27
页数 25页 分类号 TN2
字数 语种
DOI
五维指标
传播情况
(/次)
(/年)
引文网络
引文网络
二级参考文献  (0)
共引文献  (0)
参考文献  (0)
节点文献
引证文献  (0)
同被引文献  (0)
二级引证文献  (0)
2021(0)
  • 参考文献(0)
  • 二级参考文献(0)
  • 引证文献(0)
  • 二级引证文献(0)
研究主题发展历程
节点文献
Planar
scale
grating
Interference
lithography
Lloyd’s
mirror
interferometer
Interference
fringe
研究起点
研究来源
研究分支
研究去脉
引文网络交叉学科
相关学者/机构
期刊影响力
纳米制造与计量(英文)
季刊
2520-811X
12-1463/TB
出版文献量(篇)
30
总下载数(次)
0
总被引数(次)
0
论文1v1指导