PMMA-Based Microsphere Mask for Sub-wavelength Photolithography

Wenhe Feng; Xincai Wang; Yin Chi Wan

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PMMA-Based Microsphere Mask for Sub-wavelength Photolithography

PMMA-Based Microsphere Mask for Sub-wavelength Photolithography

作者：

Wenhe Feng Xincai Wang Yin Chi Wan

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Ultrafast

laser

Microspheres

Mie-scattering

PHOTOLITHOGRAPHY

MASK

Micro/nano-fabrication

process

摘要：

The authors present a polymethyl methacrylate(PMMA)-based,reusable microsphere mask used in the laser sub-wavelength photolithography.In order to overcome the diffraction limit to achieve nano-structuring using l-|im laser wavelength,the photolithography technique was conventionally characterized by applying a one-off monolayer of silica microspheres serving as Mie scatterers.Addressing the major limitation of this technique,which was that the monolayer of microspheres must be prepared on the sample surface prior to fabrication,the proposed hot press approach could firmly fuse the 1silica microspheres to the PMMA base without the use of adhesives.The PMMA-based microsphere mask could hence reduce the amount of work for the monolayer preparation and was proven reusable for at least 20 times without damage to top or bottom surfaces.Using the mask,dimples that were 0.7 pm in diameter and 40 nm in depth were produced on tool steel by a single pulse of picosecond laser irradiation.

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文献信息

篇名	PMMA-Based Microsphere Mask for Sub-wavelength Photolithography
来源期刊	纳米制造与计量(英文)	学科	工学
关键词	Ultrafast laser Microspheres Mie-scattering PHOTOLITHOGRAPHY MASK Micro/nano-fabrication process
年，卷（期）	2020,（3）	所属期刊栏目
研究方向		页码范围	199-204
页数	6页	分类号	TN2
字数		语种
DOI